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Article information
2013 , Volume 18, ¹ 5, p.58-73
Grigoryev Y.N., Gorobchuk A.G.
Numerical model of rf-discharge in a plasmachemical reactor
In this paper we consider a numerical model of axisymmetrical RF-discharge in hydrodynamical approach. We use the implicit exponential finite-difference scheme that ensures positive values of the electron temperature and the concentrations of plasma components. This model was used for numerical solution of the electron and ion continuity equations as well as for the electron energy balance equation. The developed algorithm closes a numerical model of plasma chemical etching, that was created in the previous works by the author.
[full text]
Keywords: RF-discharge, hydrodynamical model, plasmachemical etching
Author(s):
Grigoryev Yurii Nikolaevich
Dr. , Professor
Position: General Scientist
Office: Federal Research Center for Information and Computational Technologies
Address: 630090, Russia, Novosibirsk, Ac. Lavrentiev ave., 6
Phone Office: (383) 330 87 45
E-mail: grigor@ict.nsc.ru
Gorobchuk Aleksey Gennadievich
Dr.
Position: Senior Research Scientist
Office: Federal Research Center for Information and Computational Technologies
Address: 630090, Russia, Novosibirsk, Ac. Lavreniev ave., 6
Phone Office: (383) 330-87-45
E-mail: alg@eml.ru
Bibliography link:
Grigoryev Y.N., Gorobchuk A.G. Numerical model of rf-discharge in a plasmachemical reactor // Computational technologies. 2013. V. 18. ¹ 5. P. 58-73
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